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ABOUT THIS WEBINAR
Join us for an in-depth look at how the NexION 5000 multi-quadrupole ICP-MS revolutionizes the detection of metallic impurities in ultra-pure N-Methyl Pyrrolidone (NMP), a critical solvent for semiconductor fabrication. The NexION 5000 enables precise, interference-free analysis of trace elements, meeting the rigorous demands of the semiconductor industry. Learn how advanced innovations like reaction mode technology and enhanced signal-to-background ratios ensure unparalleled sensitivity and accuracy for your quality control needs.
HIGHLIGHTS
  • How NexION 5000 enables direct analysis of organic solvents, eliminating the need for complex pretreatment methods.
  • Key advantages of multi-quadrupole technology in removing spectral interferences for trace element detection.
  • Detailed insights into achieving sub-ppt detection limits for 37 metallic impurities in semiconductor-grade NMP.
  • Best practices for ensuring contamination-free results and optimizing analytical performance.
FEATURED PRESENTERS